【正文】 西安建筑科技大學(xué) 本科畢業(yè)設(shè)計(jì)（論文） 題 目 柔性光刻工藝 實(shí)驗(yàn)研究 學(xué)生姓名 學(xué) 號(hào) 院（系） 機(jī)電工程 學(xué)院 專 業(yè) 機(jī)械設(shè)計(jì)制造以及自動(dòng) 化 指導(dǎo)教師 時(shí) 間 摘要 近年來(lái)， 在 平面 和 曲面上制造微納米結(jié)構(gòu)的應(yīng)用范圍越來(lái)越廣泛，例如柔性顯示器、柔性晶體管、柔性存儲(chǔ)器和柔性太陽(yáng)能電池等。我們進(jìn)行的柔性光刻工藝為生產(chǎn)實(shí)踐提供了理論基礎(chǔ) ， 具有指導(dǎo)意義。 采用柔性掩膜板來(lái)替代目前的玻璃掩膜進(jìn)行柔性 光刻工藝，不僅可方便地實(shí)現(xiàn)無(wú)殘余留膜的圖形化結(jié)構(gòu)，圖形的制作精度較高，圖形尺寸的線寬也較??；而且可以對(duì)曲面 基底進(jìn)行曝光，改變了傳統(tǒng)光刻只能對(duì)平面基底進(jìn)行圖形化的現(xiàn)狀。另外 ，柔性光刻只需要施加很小的接觸力就可以使掩膜板同基底密合接觸了，不像傳統(tǒng)光刻需要對(duì)掩膜板和基底之間造成真空狀態(tài)以增大兩者的密合接觸。 本文進(jìn)行了 柔性光刻工藝實(shí)驗(yàn)。柔性光刻具體的工藝過(guò) 程和傳統(tǒng)光刻類似，需要基片處理、涂膠、前烘、曝光、顯影、堅(jiān)膜、檢測(cè) 等，最終得到圖形化的光刻膠。實(shí)驗(yàn) 中 采取改變 單一參數(shù) （ 曝光時(shí)間或顯影時(shí)間 ） 并固定其余參數(shù)的方法 來(lái)研究 各參數(shù) 對(duì) 光刻質(zhì)量的影響。利用光學(xué)顯微鏡對(duì)光刻圖形進(jìn)行觀察 對(duì)比，從而選擇 優(yōu)化 的曝光時(shí)間和顯影時(shí)間，得到具有高精度、高保真度的光刻膠圖形。 關(guān)鍵詞 ： 柔性 光刻 ， 柔性掩膜版，光刻膠， 曝光 ，顯影 Abstract In recent years, the fabrication of micro nano structure application scope is more and more widely in the flat and curved surfaces, such as flexible displays, flexible transistor, flexible memory and flexible solar cells. Soft lithography process we provide a theoretical basis for production practice, has guiding significance. Flexible mask plate to replace the current glass flexible lithography mask using, not only can be easily achieved without residual graphical structure with film, making high precision graphics, line graph size is smaller。 and the curved substrate exposure, changed the status of the graphic on planar substrate traditional lithography only. In addition, soft lithography requires only applied contact force small can make the mask close contact with the substrate, unlike traditional lithography requires close contact caused by vacuum state between the mask and substrate to increase both the alloy. This article soft lithography process. Soft lithography specific process and the traditional photolithography need similar, substrate processing, coating, drying, exposure, developing, hardening, detection, finally get the patter ned photoresist. In the experiment by changing a single parameter (the exposure time and development time) and fixed the parameter method to study the effects of each parameter on image quality. Comparison of the photoresist pattern were observed by optical microscope, so as to choose optimal exposure time and development time, obtained with a photoresist pattern of high precision, high fidelity. Key Words: soft lithography, flexible mask, resist, exposure, development 目錄 1 緒論 ........................................................................................................................... 1 引言 .................................................................................................................... 1 光刻技術(shù)的應(yīng)用 ................................................................................................ 2 本文研究的目的和意義 .................................................................................... 2 本文的研究?jī)?nèi)容 ................................................................................................ 3 2 光刻機(jī)及光刻膠 ....................................................................................................... 5 光刻機(jī) ................................................................................................................ 5 光刻機(jī)發(fā)展歷程 ......................................................................................... 5 國(guó)內(nèi)光刻機(jī)發(fā)展現(xiàn)狀 ................................................................................. 6 光刻技術(shù)的基本原理 ................................................................................. 7 光刻成像質(zhì)量評(píng)價(jià)的重要指標(biāo) ................................................................. 8 提高光刻機(jī)性能的關(guān)鍵技術(shù) ................................................................... 10 光刻膠 .............................................................................................................. 12 光刻膠的性質(zhì) ........................................................................................... 12 光刻膠的種類 ........................................................................................... 12 光刻膠的配制 ........................................................................................... 13 正膠和負(fù)膠的比較 ................................................................................... 14 對(duì)光刻膠性能的要求 ............................................................................... 14 3 柔性光刻工藝流程 ................................................................................................. 16 柔性光刻工藝的定義 ...................................................................................... 16 柔性光刻工藝流程 .......................................................................................... 17 光刻常見(jiàn)問(wèn)題及穩(wěn)定措施 .............................................................................. 24 針孔 ........................................................................................................... 25 浮膠 ........................................................................................................... 25 鉆蝕 ........................................................................................................... 26 放射狀條紋 ............................................................................................... 26 影響光刻分辨率的因素 .................................................................................. 27 光刻膠膜的質(zhì)量和厚度 ........................................................................... 27 掩膜版與光刻膠膜的接觸情況 ............................................................... 27 曝光時(shí)間 ................................................................................................... 27 曝光光線的平行度 ................................................................................... 27 光的衍射和反射 ....................................................................................... 27 掩膜版的分辨率和質(zhì)量 ..............................................