左手材料-負(fù)折射率材料(參考版)
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【正文】 (n=) that are a function of the frequency.. Fig 9. (a) Measured angular profile of the normalized Ez(r), at f = GHz for detector distances of 33 and 66 cm from the wedges. (b) Measured 33 cm data pared to simulated results at 33, 66, and 238 cm (100? )from the wedges. Fig 10. Perfect lensing in action: (A) the far field and (B) the near field, translating the object into a perfect image. (C) Microwave experiments* demonstrate that subwavelength focusing is possible, limited only by losses in the system. (D) Measured data pared to the perfect results. Losses limit the resolution to less than perfect but better than the diffraction limit. C D * Grbic A. ,Eleftheriades G. , Phy. Rev. Lett. ,2021,92,117403 222 1 ??? p?? 20222 1 ???????F22m p m o220 m o() 1i? ? ??? ??? ? ? ? ? ? ??mo－磁共振頻率； ?mp－磁等離子化頻率 ?eo－電子共振頻率； ?ep－電等離子化頻率 22ep eo220 eo() 1i? ? ??? ??? ? ? ? ? ? ?只要 ?0 ? ?p， ?、 ?就可以同時(shí)為負(fù)數(shù)。 (n=) and is independent of frequency。 隨著負(fù)折射率材料的發(fā)展 ， 許多原有的技術(shù)將得到新的發(fā)展 。 Parimi P., Lu W., et al. ,Phy. Rev. Lett. ,2021,92,127401 Fig 12 (a) Experimental setup (not to scale). (b) Propagation vectors for positive and negative refraction. (c) –(f ) Microwave electric field maps in the far field region. (c) Negative and (e) positive refraction by the metallic PC prism for the incident beam along ?！?K (incident angle 30? ). WF(wave front) with
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