【正文】 en the mask and substrate to increase both the alloy. This article soft lithography process. Soft lithography specific process and the traditional photolithography need similar, substrate processing, coating, drying, exposure, developing, hardening, detection, finally get the patter ned photoresist. In the experiment by changing a single parameter (the exposure time and development time) and fixed the parameter method to study the effects of each parameter on image quality. Comparison of the photoresist pattern were observed by optical microscope, so as to choose optimal exposure time and development time, obtained with a photoresist pattern of high precision, high fidelity. Key Words: soft lithography, flexible mask, resist, exposure, development 目錄 1 緒論 ........................................................................................................................... 1 引言 .................................................................................................................... 1 光刻技術(shù)的應(yīng)用 ................................................................................................ 2 本文研究的目的和意義 .................................................................................... 2 本文的研究?jī)?nèi)容 ................................................................................................ 3 2 光刻機(jī)及光刻膠 ....................................................................................................... 5 光刻機(jī) ................................................................................................................ 5 光刻機(jī)發(fā)展歷程 ......................................................................................... 5 國(guó)內(nèi)光刻機(jī)發(fā)展現(xiàn)狀 ................................................................................. 6 光刻技術(shù)的基本原理 ................................................................................. 7 光刻成像質(zhì)量評(píng)價(jià)的重要指標(biāo) ................................................................. 8 提高光刻機(jī)性能的關(guān)鍵技術(shù) ................................................................... 10 光刻膠 .............................................................................................................. 12 光刻膠的性質(zhì) ........................................................................................... 12 光刻膠的種類(lèi) ........................................................................................... 12 光刻膠的配制 ........................................................................................... 13 正膠和負(fù)膠的比較 ................................................................................... 14 對(duì)光刻膠性能的要求 ............................................................................... 14 3 柔性光刻工藝流程 ................................................................................................. 16 柔性光刻工藝的定義 ...................................................................................... 16 柔性光刻工藝流程 .......................................................................................... 17 光刻常見(jiàn)問(wèn)題及穩(wěn)定措施 .............................................................................. 24 針孔 ........................................................................................................... 25 浮膠 ........................................................................................................... 25 鉆蝕 ........................................................................................................... 26 放射狀條紋 ............................................................................................... 26 影響光刻分辨率的因素 .................................................................................. 27 光刻膠膜的質(zhì)量和厚度 ........................................................................... 27 掩膜版與光刻膠膜的接觸情況 ............................................................... 27 曝光時(shí)間 ................................................................................................... 27 曝光光線的平行度 ................................................................................... 27 光的衍射和反射 ....................................................................................... 27 掩膜版的分辨率和質(zhì)量 ........................................................................... 27 4 柔性光刻工藝實(shí)驗(yàn) ................................................................................................ 28 引言 .................................................................................................................. 28 光刻設(shè)備及材料 .............................................................................................. 28 柔性光刻工藝流程 .......................................................................................... 29 基底處理 ................................................................................................... 29 旋轉(zhuǎn)涂膠 ................................................................................................... 30 前烘 ........................................................................................................... 30 對(duì)準(zhǔn)與曝光 ............................................................................................... 31 顯影 ........................................................................................................... 32 后烘 ........................................................................................................... 32 圖形檢測(cè) .................................................................................................. 32 結(jié)果和討論 ...................................................................................................... 33 平面基底的柔性光刻工藝 ....................................................................... 33 曲面基底的柔性光刻工藝 ....................................................................... 37 待解決的關(guān)鍵問(wèn)題 ................................................................................... 38 實(shí)驗(yàn)小結(jié) .