薄膜系統(tǒng)光學(xué)性質(zhì)的理論分析及其應(yīng)用探討(已修改)
2025-07-04 12:24 本頁面
【正文】 武漢工業(yè)學(xué)院畢業(yè)論文論文題目：薄膜系統(tǒng)光學(xué)性質(zhì)的理論分析及其應(yīng)用探討姓 名 楊 磷 學(xué) 號 071203203 院 （系） 數(shù) 理 科 學(xué) 系 專 業(yè) 電子信息科學(xué)與技術(shù)指導(dǎo)教師 謝 柏 林 2011年05月11日目錄摘要 IAbstract II第一章 緒論 1 1 1 2 2第二章 多光束干涉理論 10 10 11 極值條件 11 法布里—珀羅干涉儀與邁克耳孫干涉儀的比較 12 應(yīng)用 12第三章 矩陣?yán)碚?14 目的和內(nèi)容 14 14 14 15 15 相關(guān)概念及定義 15 矩陣運(yùn)算 17第四章 總結(jié)和展望 18致謝 19主要參考文獻(xiàn) 20摘要 隨著現(xiàn)代科學(xué)技術(shù)的飛速發(fā)展,光學(xué)薄膜器件得到了越來越廣泛的應(yīng)用,從日常生活到人造衛(wèi)星乃至現(xiàn)代光通信,其中都有起著重要作用的光學(xué)薄膜器件，例如日常生活中眼鏡的鏡片膜、平板顯示、光通信中的窄帶濾波片、高精密光學(xué)儀器中各種薄膜元件等。光學(xué)薄膜技術(shù)在得到廣泛的應(yīng)用同時也導(dǎo)致對其光學(xué)性質(zhì)和制備工藝的要求越來越高。光學(xué)薄膜的制作是一個涉及到多學(xué)科交叉協(xié)作的復(fù)雜過程,受到不同材料、不同工藝以及一些突發(fā)因素的影響。制備一個高質(zhì)量的功能性光學(xué)薄膜，首先需要對其進(jìn)行精確的模擬計(jì)算，對每一層介質(zhì)的光學(xué)常數(shù)和厚度進(jìn)行控制。當(dāng)薄膜的厚度在1100nm尺度時，薄膜具有納米晶體結(jié)構(gòu)。納米晶體材料結(jié)構(gòu)不同于常規(guī)的晶態(tài)或者非晶態(tài)，其納米尺寸的晶體結(jié)構(gòu)比微觀的分子大，卻又比宏觀的體晶體小的多，使得其光學(xué)常數(shù)表現(xiàn)出不同于常規(guī)體模塊的光學(xué)性質(zhì)。特別是當(dāng)薄膜厚度很小時，由于表面原子的影響作用顯著，其折射率由于受到與表面原子層的耦合作用會發(fā)生顯著的變化，人工生長薄膜控制的光學(xué)常數(shù)包括折射率等色散特性是影響光電子器件性能的關(guān)鍵因素。納米晶體材料由于其結(jié)構(gòu)特殊，性質(zhì)優(yōu)異，已經(jīng)引起了世界各國科學(xué)家的廣泛關(guān)注和參與。在光學(xué)領(lǐng)域里，納米晶體材料具有許多比體材料更優(yōu)異的性質(zhì)，如納米SiO光學(xué)纖維比其體材料的光傳輸損耗小得多，有些納米材料對紫外波段的光具有吸收特性，可用于減少日光燈紫外光對人體的傷害。對納米晶體薄膜的光學(xué)性質(zhì)的研究，有助于增加人類對光學(xué)薄膜的認(rèn)識，提高光學(xué)薄膜的質(zhì)量，擴(kuò)大光學(xué)薄膜的應(yīng)用領(lǐng)域。鑒于主要的光學(xué)薄膜器件，如反射膜﹑減反射膜﹑偏振膜﹑干涉濾光片和分光鏡等等在國民經(jīng)濟(jì)和科學(xué)研究中有重要的應(yīng)用，而其常用的介質(zhì)材料為SiO和TaO，而目前國內(nèi)尚未對SiO, TaO薄膜的折射率等色散特性隨厚度變化的變化特性做詳細(xì)的測量分析，本課題將優(yōu)先對不同工藝下制備的SiO和TaO的納米晶體薄膜的光學(xué)性質(zhì)進(jìn)行研究。關(guān)鍵詞：物理光學(xué) 薄膜系統(tǒng) 光的反射和透射率AbstractWith the rapid development of modern science and technology, optical thin film devices has been more widely used, as well as from everyday life to modern optical munication satellite, which plays an important role in both the optical thin film devices, such as glasses in daily life lens membrane, flat panel display, optical munication narrow band filters, highprecision optical instruments of various film ponents. Optical thin film technology is widely used in the same time also led to preparation of its optical properties and the increasingly high demand.The production of optical thin film is a multidisciplinary collaboration involving the plex process by different materials, different techniques as well as some unexpected factors. Preparation of a highquality functional optical film, first of all need to be precise simulation of the optical constants of each layer and the thickness of the media control. When the film thickness in the 1100nm scale, the film has a nanocrystalline structure. Structure of nanocrystalline materials differ from conventional crystalline or amorphous, the crystal structure of nanosized molecules than the microlarge, but smaller than the macrocrystal multibody, making it different from the conventional optical constants show the optical properties of the body module. Especially when the film thickness is small, the impact of surface atoms as a significant effect, the refractive index of the surface atomic layer due to the coupling of a significant change occurs, artificial control of the growth of thin film optical constants including refractive index, dispersion characteristics affecting the photoelectron a key factor in device performance. Nanocrystalline materials because of its special structure, the nature of excellence, has attracted world wide attention and participation of scientists. In the optical domain, nanocrystalline materials have many more excellent than the material properties, such as nanoSiOoptical fibers than the material of the optical transmission loss is much smaller, and some nanomaterials with ultraviolet absorption characteristics of light can be used UV lamp to reduce the harm
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