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【正文】 File= New = Cell Your library name Choose Virtuso for layout view, Schematic for schematic view Specify your cell name NTUEE 8 Open Layout Editor File = Open … Choose Library Choose Layout view Choose Cell NTUEE 9 Layout Editor Present point Relative point present mand LSW Bar click middle button NTUEE 10 Physical Layout Techniques ? Once a circuit design is plete, it bees necessary to provide an areaefficient layout of the circuit to generate the masks necessary for fabrication. ? We must define the following: ”NWELL”, “PWELL”, “THIN”, “GPOLY”, “CONT”, “METAL1”, “METAL2”, “METAL3”, “VIA1”, “VIA2”, “NPIMP”, “PPIMP” in the layout database for TSMC process of CIC. NTUEE 11 Physical Layout Techniques NTUEE 12 Physical Layout Techniques ? The n+ diffusion can be defined by “NPIMP” and “THIN”. With poly across, a NMOS is formed. ? The p+ diffusion can be defined by “PPIMP” and “THIN”. With poly across, a PMOS is formed. Also PMOS is formed on “NWELL”. ? Conductor: Poly and metals. They are in different layer and disconnected unless through “CONT” or “VIA”. “CONT” is for poly and metal1. “VIA” is used between 2 metals. ? There
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