pulsedlaserdeposition(pld)-文庫吧資料
2025-07-23 17:03本頁面
【正文】 peratures, but may get intermixing CCD /PMT spectrometer Target Substrates or Faraday cup laser beam Pulsed Laser Deposition CCD /PMT spectrometer Target Substrates or Faraday cup laser beam Pulsed Laser Deposition Target: Just about anything! (metals, semiconductors…) Laser: Typically excimer (UV, 10 nanosecond pulses) Vacuum: Atmospheres to ultrahigh vacuum Advantages of PLD ? Flexible, easy to implement ? Growth in any environment ? Exact transfer of plicated materials (YBCO) ? Variable growth rate ? Epitaxy at low temperature ? Resonant interactions possible (., plasmons in metals, absorption peaks in dielectrics and semiconductors) ? Atoms arrive in bunches, allowing for much more controlled deposition ? Greater control of growth (., by varying laser parameters) Disadvantages of PLD ? Uneven coverage ? High defect or particulate concentration ? Not well suited for largescale film growth ? Mechanisms and dependence on parameters not well understood Processes in PLD Laser pulse Processes in PLD e e e e e e e e e e e e e e Electronic excitation Processes in PLD e e e e e e e e e e e e e e Energy relaxation to lattice (~1 ps) lattice Processes in PLD Heat diffusion (over microseconds) lattice Processes in PLD Melting (tens of ns), Evaporation, Plasma Formation (microseconds), Resolid
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