【正文】 1) Thermal oxidation growing on Si Dry oxidation: (1150176。 C~700176。m ? Reduction in diffraction, reflection, and scattering effects ? Not affected by anic defects in mask Cons – Shadow printing – Lateral magnification error – Brighter xray sources needed – More sensitive resists needed – Difficult fabrication of xray mask 4. Electron Beam Lithography As scanning electron microscopes, an electron beam scans across the substrate surface and exposes electron sensitive coating. Pros ? Computercontrolled beam ? No mask is needed ? Can produce sub1 181。 C ) 5um~50um polySi 2224 2HS iOOS iH ???P o ly S iS iH ?424334 12HNSi4 NH3 S i H ???LPCVD（低壓 CVD） P102 Pa PECVD (等離子增強 CVD) 5)Electroplating Another way to add thin film on surface. Coating of an object with a thin layer of metal by use of electricity. A classical method to ―grow‖ metal onto surface Typical materials used for plating: Cu, Au, Ag, Cr Thickness 100um 7. Micro Fabrication Technologies （一） Surface micromachining （二） Bulk micromachining concept for Bulk Micromachining 1) Selectivity—A process is selectivity if it etches the desired direction at a higher rate and all other surface at a lower rate. 2) Isotropic Same etching rate at all directions. 3) Anisotropic– direction selected 4) Wet etching This is the simplest etching technology. All it requires is a container wit