cmos的工藝技術(shù)(已修改)
2025-02-17 20:35 本頁(yè)面
【正文】 CMOS工藝技術(shù) CMOS工藝流程 ∶ CSMCHJ Wafer Fabrication Process Technology CMOS CMOS Starting with a silicon wafer Cross Section of the Silicon Wafer Magnifying the Cross Section CMOS n/pwell Formation Grow Thin Oxide Deposit Nitride Resist silicon substrate UV Exposure Develop Resist Etch Nitride nwell ImplantRemove Resist CMOS n/pwell Formation silicon substrate Grow Oxide (nwell) Remove Nitride pwell Implant OxideTwinwell Drivein pwell nwell DriveIn Oxide silicon substrate pwell nwell CMOS LOCOS Isolation Grow Thin Oxide Deposit Nitride Resist UV Exposure Develop Etch Nitride Remove CMOS LOCOS Isolation silicon substrate pwell nwell Deposit Resist UV Exposure Develop Resist Field Implant B Remove Grow Field Oxide Fox NitrideOxide silicon substrate pwell nwell Grow Screen Oxide CMOS Transistor Fabrication Vt I
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